We gained control over epitaxial growth of quartz on silicon by chemical solution deposition to demonstrate the structuring of those films by soft lithography. The key aspects to obtain the desired microstructure were the surfactant, the concentration of melting agent, the deposition of several layers and relative humidity.

Tailoring the crystal growth of quartz on silicon for patterning epitaxial piezoelectric films
Qianzhe Zhang, David Sanchez-Fuentes, Andrés Gomez, Rudy Desgarceaux, Benoit Charlot, Jaume Gazquez, Adrian Carretero-Genevrier, Martí Gich
Nanoscale Advances 1, 3741-3752, 2019
DOI: 10.1039/c9na00388f

Figure: The systematic study of chemical solution deposition parameters has made possible finding the optimal conditions to prepare structured epitaxial quartz films on silicon by soft lithography.

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