Technician in charge: Raul Solanas
Scientist in charge: Florencio Sánchez
The Thin Films service allows for the fabrication of complex oxide thin films and other heterostructures, through Pulsed Laser Deposition (PLD), a technique particularly useful to create films with complex stoichiometry and to grow epitaxial films and heterostructures. Reflection high energy electron diffraction (RHEED) can be used for in-situ characterization. The sputtering technique is also available for metal deposition. Heterostructures combining metals and oxides can be fabricated in a single process.
A UPS equipment has been installed to prevent equipment damage in case of power failure. Also, the purging system of the Argon line has been improved to improve gas purity.
The Service has deposited 462 films and multilayers. The research groups that have accessed the Thin Films Service are: MULFOX (342 deposition processes), SUMAN (88 deposition processes), N&N (29 deposition processes) and CMEOS (3 deposition processes). During 2019, a research group from France has accessed the Service, for 3 days, through the NFFA Action.
The Thin Films Service is one of the ICMAB laboratories that periodically receive the visits of students of secondary and primary schools. In 2019, the PLD equipment received the visit of 5 schools.
The service is co-author of the following publication Growth Window of Ferroelectric Epitaxial Hf0.5Zr0.5O2 Thin Films. J. Lyu, I. Fina, R. Solanas, J. Fontcuberta, F. Sánchez. ACS Appl. Electron. Mater. 2019, 1, 2, 220-228.
The service participates actively in the project “Fundamentals and Enhanced Functionalities of Complex Ferroelectric Oxides.” RTI2018-098537-B-C21.